TOKYO--(BUSINESS WIRE)--Nikon Corporation has announced release of the NSR-S622D ArF immersion scanner to deliver world-class overlay and ultra-high productivity for the most demanding multiple ...

Directed self-assembly (DSA) is moving back onto the patterning radar screen amid ongoing challenges in lithography. Intel continues to have a keen interest in DSA, while other chipmakers are taking ...

Nanoimprint lithography (NIL) is re-emerging amid an explosion of new applications in the market. Canon, EV Group, Nanonex, Suss and others continue to develop and ship NIL systems for a range of ...

Standard photolithography techniques produce various micropatterns but are limited to a feature size of approximately a micron 1. To overcome this limitation, conventional nanolithography techniques ...

The new materials and new phenomena that result from size are driving nanotechnology applications. One of the major challenges is creating these tiny objects in the shape and orientation to have ...